- . 41


Phys. Letters, 1972, v. 19, p. 173 174.

43. Ames I., d'Heurle F. M., Horstmann R. E. Reduction of electro-migration in aluminum films by copper doping. IBM Journ. of Res. and Development, 1970, v. 14, p. 461 465.

44. Garbonshain V. Gold: the new standard in transistor reliability. Microwaves, 1972, v. 4, 7, p. 54 55.

45. Tadetoshi Nazaki, Hidekazu Okabayashi. Suppression of mobile ion related instability in Mo-gate MOS-structures. Journ. of Electrochem. Society, 1981, v. 128, 1, p. 175 179.

46. . . . .: , 1976. . 75 261, 337 423.

47. / . . . . .: , 1982. . 107 125.

48. / . . . . .: , 1978. . 73 175.

49. . . ­ . .: , 1981. . 139 176.

50. . ., . 3., . . ­ . ­, 1975, . 30, 11, . 101 104.

51. . . .: , 1979.

52. / . . . , . . . .: , 1982, . 135 153.

53. . . . , 1983, 6, . 29 32.

54. . . . . . 2, 1978, . 3, . 14 23.

55. . ., . . ­ - / . . . . .: , 1982, . 3 96.

56. ­ / . 3. . . .: . , 1980.

57. . . .